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1

Production of High-Density Capacitively Coupled Plasma with RF Multi-Hollow Cathode and/or High Secondary Electron Emission for DLC Film Preparation

Yasunori Ohtsu, Chisa Nakamura, Tatsuya Misawa, Hiroharu Fujita, Morito Akiyama, Ken Yukimura

Journal:

Plasma Processes and Polymers

Year:

2009

Language:

english

File:

PDF, 185 KB

english, 2009

2

Structure and hardness of a-C:H films prepared by middle frequency plasma chemical vapor deposition

Guangwei Guo, Guangze Tang, Yajun Wang, Xinxin Ma, Mingren Sun, Liqin Wang, Ken Yukimura

Journal:

Applied Surface Science

Year:

2011

Language:

english

File:

PDF, 411 KB

english, 2011

3

Preface

Isao Yamada, Ken Yukimura, Yuji Horino

Journal:

Surface and Coatings Technology

Year:

2001

Language:

english

File:

PDF, 577 KB

english, 2001

4

A New Approach to High-Power Pulsed Glow Plasma Generation: Shunting Glow Plasma

Takaki, Koichi, Ogiso, Hisato, Nakano, Shizuka, Yukimura, Ken

Journal:

IEEE Transactions on Plasma Science

Year:

2012

Language:

english

File:

PDF, 668 KB

english, 2012

5

DeNOx Characteristics Using Two Staged Radical Injection Techniques

Kambara, Shinji, Kumano, Yuta, Yukimura, Ken

Journal:

IEEE Transactions on Dielectrics and Electrical Insulation

Year:

2009

Language:

english

File:

PDF, 556 KB

english, 2009

6

Pulsed ion extraction from a hybrid plasma using a shunting arc discharge

Ken Yukimura, Kenichi Ego, Takahumi Imai, Koichi Takaki, Seji Mukaigawa, Tamiya Fujiwara

Journal:

Surface and Coatings Technology

Year:

2007

Language:

english

File:

PDF, 299 KB

english, 2007

7

Ar/O2 gas pressure dependence of atomic concentration of zirconia prepared by zirconium pulse arc PBII&D

Ken Yukimura, Hiroaki Yoshinaga, Yasunori Ohtsu, Hiroharu Fujita, Keiji Nakamura, Xinxin Ma

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

2006

Language:

english

File:

PDF, 122 KB

english, 2006

8

Generation of RF plasma assisted high power pulsed sputtering glow discharge without using a magnetic field

Ken Yukimura, Arutiun P. Ehiasarian

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

2009

Language:

english

File:

PDF, 292 KB

english, 2009

9

Parametric Study of Zirconium Oxide Films Using Plasma-Based Ion Implantation and Deposition

Ken Yukimura, Hiroyuki Ono, Shuhei Akashi, Xinxin Ma

Journal:

Plasma Processes and Polymers

Year:

2006

Language:

english

File:

PDF, 269 KB

english, 2006

10

Ionization enhancement of zirconium atoms in inductively coupled discharge

Keiji Nakamura, Hiroaki Yoshinaga, Ken Yukimura

Journal:

Surface and Coatings Technology

Year:

2005

Language:

english

File:

PDF, 165 KB

english, 2005

11

Effects of Ar gas pressure on microstructure of DLC films deposited by high-power pulsed magnetron sputtering

Nakao, Setsuo, Yukimura, Ken, Ogiso, Hisato, Nakano, Shizuka, Sonoda, Tsutomu

Journal:

Year:

2013

Language:

english

File:

PDF, 516 KB

english, 2013

12

[IEEE 2007 IEEE Pulsed Power Plasma Science Conference - Albuquerque, NM, USA (2007.06.17-2007.04.22)] 2007 IEEE Pulsed Power Plasma Science Conference - Efficient Denox using an Intermittent DBD with One Cycle Sinusoidal Power Source

Yukimura, Ken, Murakami, Hiroshi, Itoh, Masayuki

Year:

2007

Language:

english

File:

PDF, 431 KB

english, 2007

13

Surface Modification of Poly(tetrafluoroethylene) Film Using Dielectric Barrier Discharge of Intermittent Pulse Voltage

Ishikawa, Shinya, Yukimura, Ken, Matsunaga, Koichi, Maruyama, Toshiro

Journal:

Japanese Journal of Applied Physics

Year:

2000

Language:

english

File:

PDF, 372 KB

english, 2000

14

Ion Extraction from Magnetically Driven Shunting Arc Plasma and Density Estimation at Sheath Boundary

Kumagai, Osamu, Mukaigawa, Seiji, Takaki, Koichi, Fujiwara, Tamiya, Yukimura, Ken, Ego, Kenichi

Journal:

IEEJ Transactions on Fundamentals and Materials

Year:

2006

File:

PDF, 573 KB

2006

15

Metallic Plasma and its Hybrid Plasma

Journal:

IEEJ Transactions on Electrical and Electronic Engineering

Year:

2008

Language:

english

File:

PDF, 156 KB

english, 2008

16

Microstructure modifications and corrosion behaviors of Cr4Mo4V steel treated by high current pulsed electron beam

Fangjun Xu, Guangwei Guo, Guangze Tang, Xinxin Ma, Liqin Wang, G.E. Ozur, Ken Yukimura

Journal:

Materials Chemistry and Physics

Year:

2011

Language:

english

File:

PDF, 1.30 MB

english, 2011

17

Preparation of zirconium oxide thin film using inductively coupled oxygen plasma sputtering

Yasunori Ohtsu, Masato Egami, Hiroharu Fujita, Ken Yukimura

Journal:

Surface and Coatings Technology

Year:

2005

Language:

english

File:

PDF, 271 KB

english, 2005

18

Effects of reactive gas addition on ionization of metal atoms in droplet-free metal ion sources

Keiji Nakamura, Akira Wakayama, Ken Yukimura

Journal:

Surface and Coatings Technology

Year:

2007

Language:

english

File:

PDF, 548 KB

english, 2007

19

Spherical shock waves produced by the partial explosions of a copper wire in air

Journal:

Electrical Engineering in Japan

Year:

1987

Language:

english

File:

PDF, 762 KB

english, 1987

20

Metal Ionization in a High-Power Pulsed Sputtering Penning Discharge

Yukimura, Ken, Ehiasarian, Arutiun P., Ogiso, Hisato, Nakano, Shizuka, Azuma, Kingo

Journal:

IEEE Transactions on Plasma Science

Year:

2011

Language:

english

File:

PDF, 517 KB

english, 2011

21

Reduction of nitrogen oxide in N[sub 2] by NH[sub 3] using intermittent dielectric barrier discharge

Nishida, Mitsunori, Yukimura, Ken, Kambara, Shinji, Maruyama, Toshiro

Journal:

Journal of Applied Physics

Year:

2001

Language:

english

File:

PDF, 342 KB

english, 2001

22

Silicon Dioxide Thin Films Prepared from Silicon Tetraacetate Using ArF Excimer Laser by Chemical Vapor Deposition

Maruyama, Atsushi, Tanaka, Naoki, Nakata, Kazuhiro, Yukimura, Ken, Yoshikado, Shinzo, Maruyama, Toshiro

Journal:

Japanese Journal of Applied Physics

Year:

1998

File:

PDF, 695 KB

1998

23

Macroparticles on titanium nitiride thin film prepared by cathodic-arc plasma-based ion implantation and deposition

Masao Kumagai, Ken Yukimura, Eiji Kuze, Toshiro Maruyama, Mamoru Kohata, Ken Numata, Hidenori Saito, Xinxin Ma

Journal:

Surface and Coatings Technology

Year:

2003

Language:

english

File:

PDF, 1.02 MB

english, 2003

24

Ion current extracted from a self ignition plasma around the target immersed in a pulsed rf ICP methane plasma

Takeshi Tanaka, Satoshi Watanabe, Giichiro Mizuno, Toshinori Takagi, Mitsuhiro Yoshida, Hiroshi Horibe, Ken Yukimura

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

2003

Language:

english

File:

PDF, 338 KB

english, 2003

25

Two switch high voltage modulator for plasma-based ion implantation

Ken Yukimura, Eiji Kuze, Koichi Matsunaga

Journal:

Surface and Coatings Technology

Year:

2002

Language:

english

File:

PDF, 240 KB

english, 2002

26

Structure and properties of multi-targets magnetron sputtered ZrNbTaTiW multi-elements alloy thin films

Feng, Xingguo, Tang, Guangze, Sun, Mingren, Ma, Xinxin, Wang, Liqing, Yukimura, Ken

Journal:

Surface and Coatings Technology

Year:

2013

Language:

english

File:

PDF, 1012 KB

english, 2013

27

Special Issue on Plasma-Based Surface Modification and Treatment Technologies

Chu, Paul K., Yukimura, Ken, Tian, Xiubo

Journal:

IEEE Transactions on Plasma Science

Year:

2009

Language:

english

File:

PDF, 93 KB

english, 2009

28

Carbon Ion Production Using a High-Power Impulse Magnetron Sputtering Glow Plasma

Yukimura, Ken, Nakano, Hisato Ogiso Shizuka, Nakao, Setsuo, Takaki, Koichi

Journal:

IEEE Transactions on Plasma Science

Year:

2013

Language:

english

File:

PDF, 3.08 MB

english, 2013

29

Spatial Distribution of a High-Power Impulse Magnetron Sputtering Glow Plasma by a Controlled Unbalanced Magnetic Field

Konishi, Takumi, Takaki, Koichi, Yukimura, Ken

Journal:

IEEE Transactions on Plasma Science

Year:

2014

Language:

english

File:

PDF, 975 KB

english, 2014

30

[IEEE 2007 IEEE International Pulsed Power Plasma Science Conference (PPPS 2007) - Albuquerque, NM (2008.6.17-2007.6.22)] 2007 16th IEEE International Pulsed Power Conference - Paprametric survey on no removal in an intermittent di-electric barrier discharge by one-cycle sinusoidal power source

Ken Yukimura,, Hiroshi Murakami,, Masayuki Itoh,

Year:

2007

Language:

english

File:

PDF, 516 KB

english, 2007

31

Guest Editorial: Special Issue on Ion Sources and Their Applications

Yukimura, Ken, Takaki, Koichi

Journal:

IEEE Transactions on Plasma Science

Year:

2013

Language:

english

File:

PDF, 170 KB

english, 2013

32

Titanium implantation profiles in silicon using metal plasma-based ion implantation technique

Masao Koto, Kazuto Ohno, Shinzo Yoshikado, Ken Yukimura, Shunji Kurooka, Yasuo Suzuki, Atsushi Kinomura, Akiyoshi Chayahara, Yuji Horino

Journal:

Materials Chemistry and Physics

Year:

1998

Language:

english

File:

PDF, 374 KB

english, 1998

33

Extraordinary deposition rate of diamond-like carbon film using HIPIMS technology

Hiratsuka, Masanori, Azuma, Akiyoshi, Nakamori, Hideki, Kogo, Yasuo, Yukimura, Ken

Journal:

Surface and Coatings Technology

Year:

2013

Language:

english

File:

PDF, 549 KB

english, 2013

34

Film deposition using 1-inch-sized HIPIMS system — Toward minimal fabrication semiconductor production system

Yukimura, Ken, Ogiso, Hisato, Nakano, Shizuka

Journal:

Surface and Coatings Technology

Year:

2014

Language:

english

File:

PDF, 1.12 MB

english, 2014

35

Special Issue on HiPIMS and High Power Glow Discharge

Yukimura, Ken, Ehiasarian, Arutiun P.

Journal:

IEEE Transactions on Plasma Science

Year:

2010

Language:

english

File:

PDF, 81 KB

english, 2010

36

Production of Titanium-Containing Carbon Plasma Using Shunting Arc Discharge for Hybrid Film Deposition

Takaki, Koichi, Murakami, Takayuki, Mukaigawa, Seiji, Fujiwara, Tamiya, Yukimura, Ken

Journal:

Japanese Journal of Applied Physics

Year:

2010

File:

PDF, 1004 KB

2010

37

Electrical Characterization of Silicon Dioxide Thin Film Prepared by ArF Excimer Laser Chemical Vapor Deposition from Silicon Tetraacetate

Maruyama, Atsushi, Nakata, Kazuhiro, Yukimura, Ken, Maruyama, Toshiro

Journal:

Japanese Journal of Applied Physics

Year:

1997

Language:

english

File:

PDF, 616 KB

english, 1997

38

Ion Extraction from Magnetically Driven Shunting Arc Plasma and Density Estimation at Sheath Boundary

Kumagai, Osamu, Mukaigawa, Seiji, Takaki, Koichi, Fujiwara, Tamiya, Yukimura, Ken, Ego, Kenichi

Journal:

IEEJ Transactions on Fundamentals and Materials

Year:

2006

Language:

english

File:

PDF, 573 KB

english, 2006

39

Estimation of plasma density in after-glow region of RF burst plasma based on voltage–current characteristics

Satoshi Watanabe, Takeshi Tanaka, Toshinori Takagi, Ken Yukimura

Journal:

Surface and Coatings Technology

Year:

2004

Language:

english

File:

PDF, 651 KB

english, 2004

40

Deposition and characterization of nanostructured WC–Co coating

Ying Chun Zhu, Chuan Xian Ding, Ken Yukimura, T.Danny Xiao, Perter R. Strutt

Journal:

Ceramics International

Year:

2001

Language:

english

File:

PDF, 1.17 MB

english, 2001

41

Effects of pressure on the structure of titanium nitride film in the preparation using metallic plasma-based ion implantation and deposition

Ken Yukimura, Tomoyuki Muraho, Masao Kumagai, Hidenori Saito, Mamoru Kohata, Toshiro Maruyama

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

2003

Language:

english

File:

PDF, 104 KB

english, 2003

42

High-Power Pulsed Magnetron Sputtering Glow Plasma in Argon Gas and Pulsed Ion Extraction

Jing, Fengjuan, Yukimura, Ken, Hara, Shiro, Nakano, Shizuka, Ogiso, Hisato, Huang, Nan

Journal:

IEEE Transactions on Plasma Science

Year:

2010

Language:

english

File:

PDF, 630 KB

english, 2010

43

Processing of Three Dimensional Components and its Applications

Journal:

IEEJ Transactions on Fundamentals and Materials

Year:

2007

Language:

english

File:

PDF, 185 KB

english, 2007

44

Microstructure and Platelet Adhesion Behavior of Titanium Oxide Films Synthesized by Reactive High-Power Pulse Magnetron Sputtering

Yin, Tai-Lei, Jing, Feng-Juan, Sun, Hong, Leng, Yongxiang, Yukimura, Ken, Huang, Nan

Journal:

IEEE Transactions on Plasma Science

Year:

2013

Language:

english

File:

PDF, 942 KB

english, 2013

45

Temporal evolution of spatial optical emission characteristics by inductively-coupled impulse sputtering (ICIS) using high power-burst 155kHz-ICP

Yukimura, Ken, Ogiso, Hisato, Nakano, Shizuka

Journal:

Year:

2020

File:

PDF, 1.80 MB

2020

46

Ar/O2 gas pressure dependences of a pulsed zirconium arc and extracted ion characteristics

Ken Yukimura, Hiroyuki Ono, Shuhei Akashi, Xinxin Ma, Yasunori Ohtsu, Hiroharu Fujita, Keiji Nakamura

Journal:

Surface and Coatings Technology

Year:

2007

Language:

english

File:

PDF, 262 KB

english, 2007

47

TiN deposition and ion current distribution for trench target by plasma-based ion implantation and deposition

Ken Yukimura, Xinxin Ma, Takashi Ikehata

Journal:

Surface and Coatings Technology

Year:

2005

Language:

english

File:

PDF, 460 KB

english, 2005

48

Efficient decomposition of NO by ammonia radical-injection method using an intermittent dielectric barrier discharge

Ken Yukimura, Kensuke Kawamura, Takashi Hiramatsu, Hiroshi Murakami, Shinji Kambara, Hiroshi Moritomi, Toru Yamashita

Journal:

Thin Solid Films

Year:

2007

Language:

english

File:

PDF, 187 KB

english, 2007

49

Plasma-based ion implantation and its application to three-dimensional materials

Journal:

Surface and Coatings Technology

Year:

2001

Language:

english

File:

PDF, 215 KB

english, 2001

50

Coating and ion implantation to the inner surface of a pipe by metal plasma-based ion implantation and deposition

Ken Yukimura, Eiji Kuze, Masao Kumagai, Mamoru Kohata, Ken Numata, Hidenori Saito, Toshiro Maruyama, Xinxin Ma

Journal:

Surface and Coatings Technology

Year:

2003

Language:

english

File:

PDF, 243 KB

english, 2003

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